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Handbook of Chemical Vapor Deposition (CVD). Principles, Technology and Applications. Von H. Pierson . Noyes Publications, Park Ridge/New Jersey 1992. 436 S., 69 Abb., 44 Tab., US‐$ 68,–
Author(s) -
Ham R.
Publication year - 1993
Publication title -
chemie ingenieur technik
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.365
H-Index - 36
eISSN - 1522-2640
pISSN - 0009-286X
DOI - 10.1002/cite.330651024
Subject(s) - ridge , chemical vapor deposition , citation , library science , engineering physics , humanities , physics , chemistry , computer science , nanotechnology , materials science , geology , philosophy , paleontology
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