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Theoretical Studies on the Mechanism of Formation of Silicon Dioxide (SiO 2 )
Author(s) -
Rutz L. K.,
Bockhorn H.
Publication year - 2005
Publication title -
chemie ingenieur technik
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.365
H-Index - 36
eISSN - 1522-2640
pISSN - 0009-286X
DOI - 10.1002/cite.200590177
Subject(s) - citation , library science , physics , humanities , chemistry , philosophy , computer science