Probing the Boundaries between Lewis‐Basic and Redox Behavior of a Parent Borylene | Zendy

Arrowsmith Merle | Zendy; Endres Sara | Zendy; Heinz Myron | Zendy; Nestler Vincent | Zendy; Holthausen Max C. | Zendy; Braunschweig Holger | Zendy

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Probing the Boundaries between Lewis‐Basic and Redox Behavior of a Parent Borylene

Author(s) -

Arrowsmith Merle,

Endres Sara,

Heinz Myron,

Nestler Vincent,

Holthausen Max C.,

Braunschweig Holger

Publication year - 2021

Publication title -

chemistry – a european journal

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.687

H-Index - 242

eISSN - 1521-3765

pISSN - 0947-6539

DOI - 10.1002/chem.202103256

Subject(s) - chemistry , halide , adduct , lewis acids and bases , carbene , alkyl , redox , boron , medicinal chemistry , dissociation (chemistry) , photochemistry , stereochemistry , organic chemistry , catalysis

The parent borylene (CAAC)(Me 3 P)BH, 1 (CAAC=cyclic alkyl(amino)carbene), acts both as a Lewis base and one‐electron reducing agent towards group 13 trichlorides (ECl 3 , E=B, Al, Ga, In), yielding the adducts 1‐ECl 3 and increasing proportions of the radical cation [1] •+ for the heavier group 13 analogues. With boron trihalides (BX 3 , X=F, Cl, Br, I) 1 undergoes sequential adduct formation and halide abstraction reactions to yield borylboronium cations and shows an increasing tendency towards redox processes for the heavier halides. Calculations confirm that 1 acts as a strong Lewis base towards EX 3 and show a marked increase in the B−E bond dissociation energies down both group 13 and the halide group.

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