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A Molecular Approach for Mitigation of Aluminum Pitting based on Films of Zinc(II) and Gallium(III) Metallosurfactants
Author(s) -
Weeraratne A. D. K. Isuri,
HewaRahinduwage Chathuranga C.,
Gonawala Sunalee,
Luo Long,
Verani Cláudio N.
Publication year - 2019
Publication title -
chemistry – a european journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.687
H-Index - 242
eISSN - 1521-3765
pISSN - 0947-6539
DOI - 10.1002/chem.201903408
Subject(s) - dielectric spectroscopy , gallium , aluminium , corrosion , zinc , chloride , spectroscopy , materials science , absorption spectroscopy , scanning electron microscope , electrochemistry , metal , analytical chemistry (journal) , pitting corrosion , chemical engineering , inorganic chemistry , metallurgy , chemistry , composite material , electrode , optics , organic chemistry , physics , quantum mechanics , engineering
The use of metallosurfactants to prevent pitting corrosion of aluminum surfaces is discussed based on the behavior of the metallosurfactants [Zn II (L N2O2 )H 2 O] ( 1 ) and [Ga III (L N2O3 )] ( 2 ). These species were deposited as multilayer Langmuir–Blodgett films and characterized by IR reflection absorption spectroscopy and UV/Vis spectroscopy. Scanning electron microscopy images, potentiodynamic polarization experiments, and electrochemical impedance spectroscopy were used to assess corrosion mitigation. Both metallosurfactants demonstrate superior anticorrosion activity due to the presence of redox‐inactive 3d 10 metal ions that enhance the structural resistance of the ordered molecular films and limit chloride mobility and electron transfer.