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Interfacial Reactions of Tetraphenylporphyrin with Cobalt‐Oxide Thin Films
Author(s) -
Wechsler Daniel,
Fernández Cynthia C.,
Tariq Quratulain,
Tsud Nataliya,
Prince Kevin C.,
Williams Federico J.,
Steinrück HansPeter,
Lytken Ole
Publication year - 2019
Publication title -
chemistry – a european journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.687
H-Index - 242
eISSN - 1521-3765
pISSN - 0947-6539
DOI - 10.1002/chem.201902680
Subject(s) - metalation , tetraphenylporphyrin , cobalt , x ray photoelectron spectroscopy , porphyrin , synchrotron radiation , chemistry , x ray absorption fine structure , oxide , desorption , adsorption , photochemistry , materials science , inorganic chemistry , crystallography , spectroscopy , stereochemistry , chemical engineering , organic chemistry , optics , physics , quantum mechanics , engineering
We have studied the adsorption and interfacial reactions of 2H‐tetraphenylporphyrin (2HTPP) with cobalt‐terminated Co 3 O 4 (111) and oxygen‐terminated CoO(111) thin films using synchrotron‐radiation X‐ray photoelectron spectroscopy. Already at 275 K, we find evidence for the formation of a metalated species, most likely CoTPP, on both surfaces. The degree of self‐metalation increases with temperature on both surfaces until 475 K, where the metalation is almost complete. At 575 K the porphyrin coverage decreases drastically on the reducible cobalt‐terminated Co 3 O 4 (111) surface, while higher temperatures are needed on the non‐reducible oxygen‐terminated CoO(111). The low temperature self‐metalation is similar to that observed on MgO(100) surfaces, but drastically different from that observed on TiO 2 (110), where no self‐metalation is observed at room temperature.