Redox‐mediated Negative Differential Resistance (NDR) Behavior in Perylenediimide Derivative: A Supramolecular Approach

Deaggregated perylenediimide (PDI) derivatives exhibit exceptionally high quantum yields, photostability and appropriate molecular features for organic electronics. This work demonstrates a metal–dye–metal framework with a large and stable negative differential resistance (NDR) at ambient conditions, built using a supramolecular strategy. The deaggregation achieved through the encapsulation of the bay‐substituted phenyl groups of aggregated ( l/d )‐Phe‐PDI dyes by the β‐CD macrocyclic host is validated through detailed spectroscopic and imaging techniques. The host–guest interaction resulted in a dramatic enhancement in the emission yield from 0.28 to 0.90. In the thin film deposits, the β‐CD/( l/d )‐Phe‐PDI complex displayed well‐connected sheet‐like morphology, whereas the uncomplexed ( l/d )‐Phe‐PDI dye remained as scattered lumps. The large and reversible I–V characteristics displaying strong NDR behavior is attributed to the oxidation/reduction processes involving the rigid π‐rich PDI core and is stable at least for about six months at ambient conditions, a promising system for organic electronics applications.