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Cover Feature: Mechanistic Insights into the Self‐Assembly of an Acid‐Sensitive Photoresponsive Supramolecular Polymer (Chem. Eur. J. 39/2019)
Author(s) -
Kartha Kalathil K.,
Allampally Naveen Kumar,
Yagai Shiki,
Albuquerque Rodrigo Q.,
Fernández Gustavo
Publication year - 2019
Publication title -
chemistry – a european journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.687
H-Index - 242
eISSN - 1521-3765
pISSN - 0947-6539
DOI - 10.1002/chem.201902342
Subject(s) - supramolecular chemistry , isomerization , photoisomerization , supramolecular polymers , polymer , polymerization , polymer chemistry , cover (algebra) , chemistry , materials science , photochemistry , molecule , catalysis , organic chemistry , mechanical engineering , engineering
Insights into the supramolecular polymerisation mechanism of an acid‐sensitive photoresponsive gelator (L1) are reported in this work. Addition of trifluoacetic acid (TFA) leads to the transformation of the anti‐parallel H‐bonded fibrillar assembly of L1 into unique superhelical braid‐like fibers stabilized by H‐bonding of parallel stacked L1:TFA dimers. Light irradiation causes the disassembly of the superhelical fibres and their reconstruction into thin fibres via a different pathway associated with a rapid cis – trans isomerisation under isothermal conditions. More information can be found in the Full Paper by G. Fernández et al. on page 9230.