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Mechanistic Insights into the Self‐Assembly of an Acid‐Sensitive Photoresponsive Supramolecular Polymer
Author(s) -
Kartha Kalathil K.,
Allampally Naveen Kumar,
Yagai Shiki,
Albuquerque Rodrigo Q.,
Fernández Gustavo
Publication year - 2019
Publication title -
chemistry – a european journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.687
H-Index - 242
eISSN - 1521-3765
pISSN - 0947-6539
DOI - 10.1002/chem.201900775
Subject(s) - azobenzene , supramolecular chemistry , polymerization , photoisomerization , supramolecular polymers , moiety , monomer , methylcyclohexane , polymer , antiparallel (mathematics) , chemistry , polymer chemistry , trifluoroacetic acid , materials science , photochemistry , stereochemistry , crystallography , organic chemistry , crystal structure , catalysis , isomerization , physics , quantum mechanics , magnetic field
The supramolecular polymerization of an acid‐sensitive pyridyl‐based ligand ( L 1 ) bearing a photoresponsive azobenzene moiety was elucidated by mechanistic studies. Addition of trifluoroacetic acid (TFA) led to the transformation of the antiparallel H‐bonded fibers of L 1 in methylcyclohexane into superhelical braid‐like fibers stabilized by H‐bonding of parallel‐stacked monomer units. Interestingly, L 1 dimers held together by unconventional pyridine–TFA N⋅⋅⋅H⋅⋅⋅O bridges represent the main structural elements of the assembly. UV‐light irradiation caused a strain‐driven disassembly and subsequent aggregate reconstruction, which ultimately led to short fibers. The results allowed to understand the mechanism of mutual influence of acid and light stimuli on supramolecular polymerization processes, thus opening up new possibilities to design advanced stimuli‐triggered supramolecular systems.