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Decomposition of Fluorinated Graphene under Heat Treatment
Author(s) -
Plšek Jan,
Drogowska Karolina Anna,
Valeš Václav,
Ek Weis Johan,
Kalbac Martin
Publication year - 2016
Publication title -
chemistry – a european journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.687
H-Index - 242
eISSN - 1521-3765
pISSN - 0947-6539
DOI - 10.1002/chem.201600901
Subject(s) - graphene , x ray photoelectron spectroscopy , raman spectroscopy , desorption , fluorine , thermal desorption spectroscopy , materials science , thermal stability , thermal desorption , chemical engineering , thermal decomposition , carbon fibers , analytical chemistry (journal) , chemistry , nanotechnology , organic chemistry , adsorption , composite material , physics , optics , composite number , engineering , metallurgy
Fluorination modifies the electronic properties of graphene, and thus it can be used to provide material with on‐demand properties. However, the thermal stability of fluorinated graphene is crucial for any application in electronic devices. Herein, X‐ray photoelectron spectroscopy (XPS), temperature‐programmed desorption (TPD), and Raman spectroscopy were used to address the impact of the thermal treatment on fluorinated graphene. The annealing, at up to 700 K, caused gradual loss of fluorine and carbon, as was demonstrated by XPS. This loss was associated with broad desorption of CO and HF species, as monitored by TPD. The minor single desorption peak of CF species at 670 K is suggested to rationalize defect formation in the fluorinated graphene layer during the heating. However, fluorine removal from graphene was not complete, as some fraction of strongly bonded fluorine can persist despite heating to 1000 K. The role of intercalated H 2 O and OH species in the defluorination process is emphasised.