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Acid‐Stable Peroxoniobophosphate Clusters To Make Patterned Films
Author(s) -
Son JungHo,
Park DeokHie,
Keszler Douglas A.,
Casey William H.
Publication year - 2015
Publication title -
chemistry – a european journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.687
H-Index - 242
eISSN - 1521-3765
pISSN - 0947-6539
DOI - 10.1002/chem.201500684
Subject(s) - tetramethylammonium , stoichiometry , niobium , cluster (spacecraft) , chemistry , molecule , phosphate , electron beam lithography , crystallography , inorganic chemistry , materials science , organic chemistry , ion , resist , computer science , programming language , layer (electronics)
Abstract Two new peroxoniobophosphate clusters were isolated as tetramethylammonium (TMA) salts having the stoichiometries: TMA 5 [HNb 4 P 2 O 14 (O 2 ) 4 ]⋅9 H 2 O and TMA 3 [H 7 Nb 6 P 4 O 24 (O 2 ) 6 ]⋅7 H 2 O. The former is stable over the pH range: 3