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New Polyoxometalates Containing Hybrid Polymers and Their Potential for Nano‐Patterning
Author(s) -
Kalyani Vishwanath,
Satyanarayana V. S. V.,
Singh Vikram,
Pradeep Chullikkattil P.,
Ghosh Subrata,
Sharma Satinder K.,
Gonsalves Kenneth E.
Publication year - 2015
Publication title -
chemistry – a european journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.687
H-Index - 242
eISSN - 1521-3765
pISSN - 0947-6539
DOI - 10.1002/chem.201405369
Subject(s) - polymer , polyoxometalate , extreme ultraviolet lithography , monomer , materials science , polymerization , trifluoromethanesulfonate , hybrid material , polymer chemistry , chemical engineering , analytical chemistry (journal) , chemistry , nanotechnology , organic chemistry , catalysis , composite material , engineering
Two new polyoxometalate (POM)‐based hybrid monomers (Bu 4 N) 5 (H)[P 2 V 3 W 15 O 59 {(OCH 2 ) 3 CNHCO(CH 3 )CCH 2 }] ( 2 ) and (S(CH 3 ) 2 C 6 H 4 OCOC(CH 3 )=CH 2 ) 6 [PV 2Mo 10 O 40 ] ( 5 ) were developed by grafting polymerizable organic units covalently or electrostatically onto Wells–Dawson and Keggin‐type clusters and were characterized by analytical and spectroscopic techniques including ESI‐MS and/or single‐crystal X‐ray diffraction analyses. Radical initiated polymerization of 2 and 5 with organic monomers (methacryloyloxy)phenyldimethylsulfonium triflate (MAPDST) and/or methylmethacrylate (MMA) yielded a new series of POM/polymer hybrids that were characterized by 1 H, 31 P NMR and IR spectroscopic techniques, gel‐permeation chromatography as well as thermal analyses. Preliminary tests were conducted on these POM/polymer hybrids to evaluate their properties as photoresists using electron beam (E‐beam)/extreme ultraviolet (EUV) lithographic techniques. It was observed that the POM/polymer hybrid of 2 with MAPDST exhibited improved sensitivity under EUV lithographic conditions in comparison to the MAPDST homopolymer resist possibly due to the efficient photon harvesting by the POM clusters from the EUV source.