Replication of Mesoporous Silica Films from Block Copolymer Films through a Chemical Vapor Approach | Zendy

Torad Nagy L. | Zendy; Suzuki Norihiro | Zendy; Matsuura Mikiya | Zendy; Maekawa Kazuhiko | Zendy; Tanabe Hirofumi | Zendy; Wu Kevin C.W. | Zendy; Yamauchi Yusuke | Zendy

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Replication of Mesoporous Silica Films from Block Copolymer Films through a Chemical Vapor Approach

Author(s) -

Torad Nagy L.,

Suzuki Norihiro,

Matsuura Mikiya,

Maekawa Kazuhiko,

Tanabe Hirofumi,

Wu Kevin C.W.,

Yamauchi Yusuke

Publication year - 2013

Publication title -

chemistry – a european journal

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.687

H-Index - 242

eISSN - 1521-3765

pISSN - 0947-6539

DOI - 10.1002/chem.201300888

Subject(s) - copolymer , mesoporous silica , replication (statistics) , materials science , vapor phase , mesoporous material , chemical engineering , phase (matter) , chemical vapor deposition , block (permutation group theory) , thin film , nanotechnology , chemistry , organic chemistry , composite material , polymer , catalysis , thermodynamics , physics , engineering , statistics , mathematics , geometry

Fit to print : This work describes a novel vapor‐phase synthesis system to directly replicate mesoporous silica films from block copolymer films without phase transitions (see figure).

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