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Replication of Mesoporous Silica Films from Block Copolymer Films through a Chemical Vapor Approach
Author(s) -
Torad Nagy L.,
Suzuki Norihiro,
Matsuura Mikiya,
Maekawa Kazuhiko,
Tanabe Hirofumi,
Wu Kevin C.W.,
Yamauchi Yusuke
Publication year - 2013
Publication title -
chemistry – a european journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.687
H-Index - 242
eISSN - 1521-3765
pISSN - 0947-6539
DOI - 10.1002/chem.201300888
Subject(s) - copolymer , mesoporous silica , replication (statistics) , materials science , vapor phase , mesoporous material , chemical engineering , phase (matter) , chemical vapor deposition , block (permutation group theory) , thin film , nanotechnology , chemistry , organic chemistry , composite material , polymer , catalysis , thermodynamics , physics , engineering , statistics , mathematics , geometry
Fit to print : This work describes a novel vapor‐phase synthesis system to directly replicate mesoporous silica films from block copolymer films without phase transitions (see figure).

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