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Can Commonly Used Hydrazine Produce n‐Type Graphene?
Author(s) -
Some Surajit,
Bhunia Prasenjit,
Hwang EunHee,
Lee Keunsik,
Yoon Yeoheung,
Seo Sohyeon,
Lee Hyoyoung
Publication year - 2012
Publication title -
chemistry – a european journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.687
H-Index - 242
eISSN - 1521-3765
pISSN - 0947-6539
DOI - 10.1002/chem.201200104
Subject(s) - graphene , hydrazine (antidepressant) , reagent , annealing (glass) , oxide , materials science , doping , nanotechnology , chemical engineering , semiconductor , inorganic chemistry , chemistry , metallurgy , optoelectronics , organic chemistry , chromatography , engineering
A simple chemical method to obtain bulk quantities of N‐doped, reduced graphene oxide (rGO) sheets (see figure) as an n‐type semiconductor through the treatment of as‐prepared GO sheets with the commonly used reducing reagent hydrazine, followed by rapid thermal annealing (RTA) is described.