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RNA Is More UV Resistant than DNA: The Formation of UV‐Induced DNA Lesions is Strongly Sequence and Conformation Dependent
Author(s) -
Kundu Lal Mohan,
Linne Uwe,
Marahiel Mohamed,
Carell Thomas
Publication year - 2004
Publication title -
chemistry – a european journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.687
H-Index - 242
eISSN - 1521-3765
pISSN - 0947-6539
DOI - 10.1002/chem.200305731
Subject(s) - dna , oligonucleotide , rna , sequence (biology) , chemistry , biophysics , dna damage , high performance liquid chromatography , dna sequencing , crystallography , biochemistry , biology , chromatography , gene
DNA and RNA hairpins, which represent well‐folded oligonucleotide structures, were irradiated and the amount of damaged hairpins was directly quantified by using ion‐exchange HPLC. The types of photoproducts formed in the hairpins were determined by ESI‐HPLC‐MS/MS experiments. Irradiation of hairpins with systematically varied sequences and conformations (A versus B) revealed remarkable differences regarding the amount of photolesions formed. UV‐damage formation is, therefore, a strongly sequence and conformation dependent process.