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Tuning Electron Transport Direction through the Deposition Sequence of MoS 2 and WS 2 on Fluorine‐Doped Tin Oxide for Improved Electrocatalytic Reduction Efficiency
Author(s) -
Liu Yajuan,
Yin Jie,
Zhou Yuqing,
Sun Luo,
Yue Wenjin,
Sun Yueming,
Wang Yuqiao
Publication year - 2019
Publication title -
chemelectrochem
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 59
ISSN - 2196-0216
DOI - 10.1002/celc.201900409
Subject(s) - tin oxide , photocurrent , materials science , tin , doping , electrode , fluorine , chemical vapor deposition , pulsed laser deposition , deposition (geology) , analytical chemistry (journal) , inorganic chemistry , chemistry , nanotechnology , thin film , optoelectronics , metallurgy , chromatography , paleontology , sediment , biology
Abstract MoS 2 −WS 2 films on fluorine‐doped tin oxide (FTO) can be vulcanized through chemical vapor deposition by using MoO 3 and WO 3 as precursors prepared by pulsed laser deposition. The electron transport direction can be tuned by the deposition sequence of metal sulfides on FTO, owing to the differences in the conduction bands (CBs, MoS 2 −4.38 vs. WS 2 −4.13 eV), defined as the energy level impedance to adjust the electron transport rate. It means that the electron transport rate from FTO to the MoS 2 surface of FTO/WS 2 /MoS 2 might be higher than the rate from FTO to the WS 2 surface of FTO/MoS 2 /WS 2 . The assumption was verified by the electrocatalytic reduction of I 3 − to I − using the above films as a counter electrode in a dye‐sensitized solar cell. The short‐circuit photocurrent density of FTO/WS 2 /MoS 2 achieved 14.16 mA cm −2 , which is superior to FTO/MoS 2 /WS 2 (11.72 mA cm −2 ), indicating that the catalytic activity of FTO/WS 2 /MoS 2 was higher than that of FTO/MoS 2 /WS 2 . The electron transport direction can be successfully regulated by tuning the deposition order.