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Cover Picture: Back‐Illuminated Si‐Based Photoanode with Nickel Cobalt Oxide Catalytic Protection Layer (ChemElectroChem 10/2016)
Author(s) -
Bae Dowon,
Mei Bastian,
Frydendal Rasmus,
Pedersen Thomas,
Seger Brian,
Hansen Ole,
Vesborg Peter C. K.,
Chorkendorff Ib
Publication year - 2016
Publication title -
chemelectrochem
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 1.182
H-Index - 59
ISSN - 2196-0216
DOI - 10.1002/celc.201600567
Subject(s) - cover (algebra) , cobalt oxide , electrolyte , nickel , catalysis , nickel oxide , materials science , layer (electronics) , cobalt , oxide , impurity , front cover , chemical engineering , optoelectronics , nanotechnology , metallurgy , chemistry , electrode , engineering , organic chemistry , mechanical engineering
The Front Cover picture shows a back‐illuminated c‐Si‐based photoanode protected by a co‐sputtered NiCoO X film, which exhibits a time‐dependent improvement in the water oxidation reaction by incorporating iron impurities from KOH electrolyte. More information can be found in the Full Paper by I. Chorkendorff and co‐workers on page 1546 in Issue 10, 2016 (DOI: 10.1002/celc.201500554).