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Back‐Illuminated Si‐Based Photoanode with Nickel Cobalt Oxide Catalytic Protection Layer
Author(s) -
Bae Dowon,
Mei Bastian,
Frydendal Rasmus,
Pedersen Thomas,
Seger Brian,
Hansen Ole,
Vesborg Peter C. K.,
Chorkendorff Ib
Publication year - 2016
Publication title -
chemelectrochem
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 59
ISSN - 2196-0216
DOI - 10.1002/celc.201600566
Subject(s) - cobalt oxide , nickel , cover (algebra) , layer (electronics) , cobalt , front cover , nickel oxide , catalysis , materials science , front (military) , oxide , nanotechnology , optoelectronics , metallurgy , chemistry , physics , engineering , meteorology , mechanical engineering , biochemistry
The front cover artwork is provided by Ib Chorkendorff, Dowon Bae, and co‐workers at the Technical University of Denmark (Denmark). The image highlights a time‐dependent improvement in the water oxidation reaction of a back‐side illuminated c‐Si‐based photoanode protected by a co‐sputtered thin film of NiCoO X with iron incorporation. Read the full text of the Article at 10.1002/celc.201500554.

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