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Potential‐Pulse‐Assisted Formation of Thiol Monolayers within Minutes for Fast and Controlled Electrode Surface Modification
Author(s) -
Jambrec Daliborka,
Conzuelo Felipe,
EstradaVargas Arturo,
Schuhmann Wolfgang
Publication year - 2016
Publication title -
chemelectrochem
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 59
ISSN - 2196-0216
DOI - 10.1002/celc.201600308
Subject(s) - surface modification , thiol , monolayer , electrode , pulse (music) , materials science , chemical engineering , nanotechnology , chemistry , computer science , organic chemistry , engineering , telecommunications , detector
We propose a potential‐pulse‐assisted method for the formation of highly compact thiol self‐assembled monolayers (SAMs), ensuring fully covered surfaces within minutes. By pulsing between potentials that are more positive and more negative with respect to the potential of zero charge, kinetics of SAM formation is substantially enhanced. The formation of the SAM is followed by using real‐time impedance measurements by superimposing the applied potential‐pulse profile with a high‐frequency AC signal that allows for calculation of the interfacial capacitance and provides information about the compactness of the formed layers. A systematic study of the influence of the pulse potential intensity, the pulse duration, and the nature of the thiol derivative on the potential‐pulse‐assisted SAM formation is performed. We show that compact thiol monolayers are obtained much faster with the suggested technique, as compared to SAM formation performed at the open‐circuit potential or by applying a constant potential.