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Inside Cover: Electrodeposition of Protocrystalline Germanium from Supercritical Difluoromethane (ChemElectroChem 5/2016)
Author(s) -
Cummings Charles Y.,
Bartlett Philip N.,
Pugh David,
Reid Gillian,
Levason William,
Hasan Mahboba M.,
Hector Andrew L.,
Spencer Joe,
Smith David C.,
Marks Samuel,
Beanland Richard
Publication year - 2016
Publication title -
chemelectrochem
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 1.182
H-Index - 59
ISSN - 2196-0216
DOI - 10.1002/celc.201600167
Subject(s) - difluoromethane , supercritical fluid , germanium , cover (algebra) , materials science , nanocrystal , nanotechnology , amorphous solid , chemical engineering , chemistry , optoelectronics , crystallography , refrigerant , engineering , organic chemistry , mechanical engineering , silicon , gas compressor
The Inside Cover Picture shows that the electrodeposition of Ge in supercritical CH 2 F 2 at 85 ºC from germanium (II) triiodide, the most readily reduced of the three trihalides studied, produces films containing nanocrystals of Ge embedded in an amorphous Ge film. More details can be found in the Full Paper by C. Cummings et al. on page 726 in Issue 5, 2016 (DOI: 10.1002/celc.201500539).