z-logo
Premium
Optimization of Titania Post‐Necking Treatment of TaON Photoanodes to Enhance Water‐Oxidation Activity under Visible‐Light Irradiation
Author(s) -
Gujral Satnam Singh,
Simonov Alexandr N.,
Higashi Masanobu,
Abe Ryu,
Spiccia Leone
Publication year - 2015
Publication title -
chemelectrochem
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 59
ISSN - 2196-0216
DOI - 10.1002/celc.201500224
Subject(s) - materials science , necking , photocurrent , photocatalysis , calcination , dielectric spectroscopy , chemical engineering , aqueous solution , irradiation , visible spectrum , electrolyte , electrode , electrochemistry , nuclear chemistry , photochemistry , composite material , chemistry , catalysis , optoelectronics , organic chemistry , physics , nuclear physics , engineering
A post‐necking treatment of porous screen‐printed TaON films with titania is optimized to improve their photocatalytic activity for water oxidation under visible‐light irradiation ( λ >400 nm). Post‐necking was achieved by applying TiCl 4 solutions in ethanol or water, or Ti( i OPr) 2 (acac) 2 (acac=acetylacetonate) in isopropanol to the films, followed by calcination at 450 °C in air. Under voltammetric and chronoamperometric conditions in Na 2 SO 4 (0.1  M , pH 6), a 25‐fold enhancement in oxidative photocurrent densities is achieved upon post‐necking of TaON by using ethanolic TiCl 4 , whereas aqueous TiCl 4 and Ti( i OPr) 2 (acac) 2 precursors afforded improvements of eight‐ and sixfold, respectively. SEM and electrochemical impedance spectroscopy studies confirm that post‐necking improves the interconnectivity of the particles and facilitates charge transfer within the photoanode and at the electrode–electrolyte interface. The highest improvement in activity was achieved by using ethanolic TiCl 4 to deposit 10–20 wt % TiO 2 on the TaON films, whereas higher loadings deteriorated the performance.

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here