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Advanced Oxidative Removal of Nitric Oxide from Flue Gas by Homogeneous Photo‐Fenton in a Photochemical Reactor
Author(s) -
Liu Y.,
Pan J.,
Du M.,
Tang A.,
Wang Q.
Publication year - 2013
Publication title -
chemical engineering and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.403
H-Index - 81
eISSN - 1521-4125
pISSN - 0930-7516
DOI - 10.1002/ceat.201200336
Subject(s) - chemistry , flue gas , homogeneous , nitric oxide , oxide , radical , inorganic chemistry , photochemistry , hydroxyl radical , organic chemistry , physics , thermodynamics
In this work, advanced oxidation removal of nitric oxide (NO) from flue gas by homogeneous Photo‐Fenton was investigated in a photochemical reactor and the effects of several influencing factors on NO removal were evaluated. The gas‐liquid reaction products were determined. The reaction pathways of NO removal are also preliminarily discussed. It was found that with the increase of Fe 2+ concentration, NO removal efficiency first increased and then decreased. Increasing H 2 O 2 concentration and UV radiation intensity greatly increased NO removal efficiency, but the growth rates gradually became smaller. NO removal efficiency greatly reduced with the increase of gas flow and NO concentration, and only slightly decreased with the increase of solution temperature, but significantly increased with the increase of initial solution pH value. The main anion product in the liquid phase was NO 3 – . With respect to removal of NO using homogeneous Photo‐Fenton, ·OH oxidation was the main reaction pathway, and H 2 O 2 oxidation was the secondary reaction pathway.