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Kinetics of the Decomposition of Hydrogen Sulfide in a Dielectric Barrier Discharge Reactor
Author(s) -
Linga Reddy E.,
Karuppiah J.,
Renken A.,
KiwiMinsker L.,
Subrahmanyam C.
Publication year - 2012
Publication title -
chemical engineering and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.403
H-Index - 81
eISSN - 1521-4125
pISSN - 0930-7516
DOI - 10.1002/ceat.201200134
Subject(s) - hydrogen sulfide , chemistry , dielectric barrier discharge , dissociation (chemistry) , hydrogen , kinetics , decomposition , chemical kinetics , chemical decomposition , volumetric flow rate , reaction rate , sulfide , argon , sulfur , analytical chemistry (journal) , inorganic chemistry , thermodynamics , environmental chemistry , catalysis , organic chemistry , electrode , physics , quantum mechanics
Kinetics of hydrogen sulfide (H 2 S) decomposition to hydrogen and sulfur was investigated in a nonthermal plasma dielectric barrier discharge (NTP‐DBD) reactor operated under ambient conditions. The reactions were carried out with a fixed flow rate and varying inlet concentration. The results indicated that the dissociation of H 2 S into H 2 and S may be initiated by excitation of the carrier gas argon. A reaction rate model based on a Langmuir Hinshelwood/Michaelis‐Menten model was proposed. The formal reaction order approaches zero at high H 2 S concentrations. The parameters of the kinetic model were found to be dependent on the power input.