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Assessing the Effect of the Electron‐Beam Irradiation on Pd/Ga 2 O 3 Catalyst under Ambient Pressure
Author(s) -
Wang Yongzhao,
Niu Yiming,
Gao Tongtong,
Liu Siyang,
Zhang Bingsen
Publication year - 2020
Publication title -
chemcatchem
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.497
H-Index - 106
eISSN - 1867-3899
pISSN - 1867-3880
DOI - 10.1002/cctc.202000699
Subject(s) - catalysis , oxidizing agent , electron beam processing , transmission electron microscopy , irradiation , materials science , nanoparticle , chemical engineering , chemistry , nanotechnology , chemical physics , organic chemistry , physics , nuclear physics , engineering
Introducing atmosphere in transmission electron microscope enables to directly observe the structural features of catalyst under working conditions. It offers the possibility to study the microstructural evolution and correlate real structures with catalytic properties at nano‐ or atomic‐scale during catalysis. However, the damages to catalyst derived from the high energy electron‐beam irradiation cannot be ignored and may lead to ambiguous conclusions, as the interaction between reactive gas molecules and active structures is only desired. Herein, the α‐Ga 2 O 3 supported Pd catalyst was selected as a model to evaluate the potential effect of electron‐beam on the surface and interface structures, which directly affect the catalytic performance, at varied atmospheres, elevated temperatures and increased electron dose rate in ambient pressure. The results indicate that the supported Pd nanoparticles could be encapsulated by GaO x layer when the imaging electron dose rate is higher than 100 e/Å 2 s under reduction and oxidizing atmosphere. Either increasing the electron dose rate or elevating the temperature exacerbates the irradiation damage to α‐Ga 2 O 3 support. This work was expected to evaluate the effect of electron dose rate to supported catalysts under chemical environments, and provide guidance for the investigation of in‐situ transmission electron microscopy under ambient pressure.