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Enthalogenierung von Aminodihalogenboranen durch Na/K‐Legierung in Gegenwart von Naphthalin, Bis(trimethylsilyl)butadiin und 2,5‐Dimethyl‐2,4‐hexadien
Author(s) -
Maringgele Walter,
Knop Henning,
Bromm Dietmar,
Meller Anton,
Dielkus Sven,
HerbstIrmer Regine,
Sheldrick George M.
Publication year - 1992
Publication title -
chemische berichte
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.667
H-Index - 136
eISSN - 1099-0682
pISSN - 0009-2940
DOI - 10.1002/cber.19921250805
Subject(s) - chemistry , trimethylsilyl , medicinal chemistry , pentane , hexane , borane , naphthalene , halogenation , organic chemistry , catalysis
Dehalogenation of Aminodihalogenoboranes by Na/K Alloy in the Presence of Naphthalene, Bis(trimethylsilyl)butadiyne, and 2,5‐Dimethyl‐2,4‐hexadiene Reaction of naphthalene with Na/K alloy and [(2,6‐diisopropylphenyl)methylamino]difluoroborane ( 1 ) in 1,2‐dimethoxyethane yields the aminodimethoxyborane 2 , the bis(amino)‐borane 3 , the diborylethyne 4 , and the diboryl oxide 5 . By addition of a mixture of bis(trimethylsilyl)butadiyne or 2,5‐dimethyl‐2,4‐hexadiene with dichloro(diisopropylamino)borane to Na/K alloy in hexane the 2,4,5‐triborabicyclo‐[1.1.1]pentane 7 and the diboretane 8 , resp., are obtained. 1 H‐, 11 B‐, 13 C‐, 19 F‐, 29 Si‐NMR‐, IR, and MS data are given. For 2–4, 7 and 8 X‐ray structure analyses are performed.