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Electromagnetic and thermal characterization of an UHF‐applicator for concurrent irradiation and high resolution non‐perturbing optical microscopy of cells
Author(s) -
Pickard William F.,
Moros Eduardo G.,
Cha Bibianna A.,
Novak Petr
Publication year - 2006
Publication title -
bioelectromagnetics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.435
H-Index - 81
eISSN - 1521-186X
pISSN - 0197-8462
DOI - 10.1002/bem.20250
Subject(s) - characterization (materials science) , ultra high frequency , microscopy , irradiation , materials science , resolution (logic) , optics , electromagnetic radiation , optical microscope , high resolution , nanotechnology , optoelectronics , biophysics , physics , scanning electron microscope , computer science , biology , nuclear physics , telecommunications , artificial intelligence , remote sensing , geology
To permit trans‐illuminated, high‐resolution optical microscopy during unperturbed ultrahigh frequency (UHF) irradiation, a novel new class of applicator has been designed based upon a shielded‐pair transmission line. As constructed and tested with water‐immersion optics and air cooling, the applicator works most robustly over 700–1100 MHz and permits SARs at the cell layer as high as 50 W/kg before the steady state temperature rise at the cell‐layer exceeds 0.5 K. Bioelectromagnetics 27:593–601, 2006. © 2006 Wiley‐Liss, Inc.