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Intrinsic Defects in Polymeric Carbon Nitride for Photocatalysis Applications
Author(s) -
Meng Aiyun,
Teng Zhenyuan,
Zhang Qitao,
Su Chenliang
Publication year - 2020
Publication title -
chemistry – an asian journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.18
H-Index - 106
eISSN - 1861-471X
pISSN - 1861-4728
DOI - 10.1002/asia.202000850
Subject(s) - photocatalysis , carbon nitride , vacancy defect , materials science , nitride , graphitic carbon nitride , carbon fibers , nanotechnology , chemistry , catalysis , composite number , organic chemistry , composite material , crystallography , layer (electronics)
Introducing intrinsic defects in polymeric carbon nitride (PCN) without the addition of exotic atoms have been verified as an available strategy to boost the photocatalytic performance. This minireview focuses on the fundamental classifications and positive roles of intrinsic defects in PCN for photocatalysis applications. The intrinsic defects in PCN are classified into several types, such as nitrogen vacancy, carbon vacancy and derivative functional groups such as cyano, amino and cyanamide groups. The critical roles of these defects on the electronic configuration, charge transfer and surface properties of PCN are also carefully classified and elaborated. Furthermore, the photocatalysis applications of the defective PCN including photocatalytic water splitting, N 2 fixation, H 2 O 2 production, CO 2 reduction and NO removal are summarized. In the end, the challenges and opportunities of defect chemistry in PCN for photocatalysis field are presented.