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Surface Engineering of Carbon Nitride Electrode by Molecular Cobalt Species and Their Photoelectrochemical Application
Author(s) -
Chen Zupeng,
Wang Hongqiang,
Xu Jingsan,
Liu Jian
Publication year - 2018
Publication title -
chemistry – an asian journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.18
H-Index - 106
eISSN - 1861-471X
pISSN - 1861-4728
DOI - 10.1002/asia.201800487
Subject(s) - materials science , tin oxide , photocatalysis , carbon nitride , cobalt oxide , electrode , cobalt , photoelectrochemistry , graphitic carbon nitride , nitride , chemical engineering , nanotechnology , tin , carbon fibers , oxide , doping , optoelectronics , chemistry , layer (electronics) , electrochemistry , catalysis , composite material , engineering , metallurgy , biochemistry , composite number
Graphitic carbon nitride (CN) has been widely regarded as a promising photocatalyst since the discovery of its capability for photocatalytic hydrogen evolution. Herein, we developed a functional CN film on a conductive fluorine‐doped tin oxide (FTO) electrode by using a microprinting‐based direct growth method. Furthermore, the photoelectrochemical performance of the derived CN@FTO film was demonstrated to be enhanced by incorporating molecular cobalt species. The reduced charge transport resistance in the cobalt‐modified CN@FTO films is suggested to accelerate the charge‐carrier transfer rate and thus to improve the performance in photoelectrochemical application. The approach is versatile and can be further optimized by selecting a proper “ink” solution and modifier on various conductive substrates.