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Back Cover: Dihydrogen Splitting Using Dialkylsilylene‐Based Frustrated Lewis Pairs (Chem. Asian J. 11/2017)
Author(s) -
Dong Zhaowen,
Li Zhifang,
Liu Xupeng,
Yan Chenting,
Wei Ningka,
Kira Mitsuo,
Müller Thomas
Publication year - 2017
Publication title -
chemistry – an asian journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.18
H-Index - 106
eISSN - 1861-471X
pISSN - 1861-4728
DOI - 10.1002/asia.201700483
Subject(s) - silylene , lewis acids and bases , chemistry , cover (algebra) , frustrated lewis pair , electron pair , base (topology) , solvent , computational chemistry , physics , silicon , organic chemistry , electron , catalysis , mathematics , quantum mechanics , engineering , mechanical engineering , mathematical analysis
An isolable dialkylsilylene reacts with dihydrogen in the presence of a small amount of a conventional Lewis acid (BPh 3 , BEt 3 ) or a base (PPh 3 , PEt 3 , NPh 3 , NEt 3 ) at low temperatures in a hydrocarbon solvent, giving the corresponding dihydrosilane in high yields. Both the silylene/Lewis acid and silylene/Lewis base pairs work as a frustrated Lewis pair (FLP) to split dihydrogen, being in accord with the amphoteric nature of the silylene. More information can be found in the Communication by Zhaowen Dong, Zhifang Li, Mitsuo Kira, Thomas Müller et al. on page 1204 in Issue 11, 2017 (DOI: 10.1002/asia.201700143).