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Self‐Assembly of a Halogenated Molecule on Oxide‐Passivated Cu(110)
Author(s) -
El Garah Mohamed,
LiptonDuffin Josh,
MacLeod Jennifer M.,
Gutzler Rico,
Palmino Frank,
Luzet Vincent,
Chérioux Frédéric,
Rosei Federico
Publication year - 2013
Publication title -
chemistry – an asian journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.18
H-Index - 106
eISSN - 1861-471X
pISSN - 1861-4728
DOI - 10.1002/asia.201300283
Subject(s) - passivation , scanning tunneling microscope , supramolecular chemistry , molecule , adsorption , substrate (aquarium) , copper , oxide , self assembly , materials science , crystallography , oxygen , copper oxide , chemistry , nanotechnology , layer (electronics) , organic chemistry , metallurgy , oceanography , geology
The supramolecular self‐assembly of brominated molecules was investigated and compared on Cu(110) and Cu(110)O(2×1) surfaces under ultrahigh vacuum. By using scanning tunnelling microscopy, we show that brominated molecules form a disordered structure on Cu(110), whereas a well‐ordered supramolecular network is observed on the Cu(110)O(2×1) surface. The different adsorption behaviors of these two surfaces are described in terms of weakened molecule–substrate interactions on Cu(110)O(2×1) as opposed to bare Cu(110). The effect of oxygen‐passivation is to suppress debromination and it can be a convenient approach for investigating other self‐assembly processes on copper‐based substrates.