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Grafting of Metallacarboranes onto Self‐Assembled Monolayers Deposited on Silicon Wafers
Author(s) -
JuárezPérez Emilio José,
Granier Michel,
Viñas Clara,
Mutin P. Hubert,
Núñez Rosario
Publication year - 2012
Publication title -
chemistry – an asian journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.18
H-Index - 106
eISSN - 1861-471X
pISSN - 1861-4728
DOI - 10.1002/asia.201100750
Subject(s) - monolayer , isocyanate , self assembled monolayer , silicon , wafer , covalent bond , grafting , homogeneous , amine gas treating , polymer chemistry , materials science , chemistry , chemical engineering , nanotechnology , organic chemistry , polyurethane , thermodynamics , physics , engineering , polymer
Stuck on you : Amine‐, oxyamine‐, and isocyanate‐terminated self‐assembled monolayers were deposited on silicon wafers for reaction with cobaltabisdicarbollide derivatives. The reaction of the isocyanate group with [NMe 4 ][8‐NH 2 ‐C 4 H 8 O 2 ‐3,3‐Co(1,2‐C 2 B 9 H 10 )(1,2‐C 2 B 9 H 11 )] gave homogeneous monolayers of cobaltabisdicarbollide moieties covalently linked to the surface (see picture).