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Molecular structure development in silsesquioxane−urethane thin film hybrids: A small‐angle neutron scattering investigation
Author(s) -
Knott Robert,
Dutta Naba K.,
Choudhury Namita Roy
Publication year - 2020
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.48772
Subject(s) - silsesquioxane , radius of gyration , materials science , polymer chemistry , polyurethane , polymer , ethylene glycol , small angle neutron scattering , chemical engineering , neutron scattering , silane , hybrid material , side chain , scattering , composite material , nanotechnology , optics , physics , engineering
The small‐angle neutron scattering (SANS) technique was used to investigate the molecular structure in situ of the synthesis of a series of polyhedral oligomeric silsesquioxane (POSS)‐based polyurethane hybrid materials with respect to the reaction time, and the hybridization chemistry. In order to tailor the material properties for application in thin film coatings of metal surfaces, the effect on the hybrid structure was investigated of a selected end‐capping agent (silane[N‐ethyl‐3‐trimethoxysilyl‐2‐methylpropanamine]; A‐Link35) and chain extension agent (poly[ethylene glycol‐ ran ‐propylene glycol]). The structure of the POSS‐urethane hybrid in solution was observed to vary between fully or partially solvated polymer chains (radius of gyration R g ~20–40 Å), and larger collapsed structures ( R g >100'sÅ). © 2019 Wiley Periodicals, Inc. J. Appl. Polym. Sci. 2020 , 137 , 48772.