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Polymer multilayer films for high temperature capacitor application
Author(s) -
Yin Kezhen,
Zhang Jingwei,
Li Zhenpeng,
Feng Jingxing,
Zhang Ci,
Chen Xinyue,
Olah Andrew,
Schuele Donald E.,
Zhu Lei,
Baer Eric
Publication year - 2019
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.47535
Subject(s) - materials science , capacitor , composite material , dielectric , polymer , dielectric loss , polysulfone , polycarbonate , thermal stability , glass transition , chemical engineering , voltage , optoelectronics , electrical engineering , engineering
Advanced film capacitors require polymers with high thermal stability, high breakdown strength, and low loss for high temperature dielectric applications. To fulfill such requirements, two polymer multilayer film systems were coextruded via the forced assembly technique. High glass transition temperature ( T g ) polycarbonate (HTPC, T g = 165 °C) and polysulfone (PSF, T g = 185 °C) were multilayered with a high dielectric constant polymer, poly(vinylidene fluoride) (PVDF), respectively. The PSF/PVDF system was more thermally stable than the HTPC/PVDF system because of the higher T g for PSF. At temperatures lower than 170 °C, the HTPC/PVDF system exhibited comparable breakdown strength and hysteresis loss as the PSF/PVDF system. While at temperatures above 170 °C, the PSF/PVDF system exhibited a higher breakdown strength because of the higher T g of PSF. The electric displacement‐electric field (D‐E) loop behavior of the PSF/PVDF system was studied as a function of temperature. Moreover, a melt‐recrystallization process could further decrease the hysteresis loss for the PSF/PVDF system due to better edge‐on crystal orientation. These results demonstrate that PSF/PVDF and HTPC/PVDF systems are applicable for high temperature film capacitors. © 2019 Wiley Periodicals, Inc. J. Appl. Polym. Sci. 2019 , 136 , 47535.