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Styryl silsesquioxane photoresist
Author(s) -
Sugita Hikaru,
Tanaka Kei,
Shirato Kaori,
Yamamoto Ryota,
Tateshima Kazuko
Publication year - 2015
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.41459
Subject(s) - photoresist , silsesquioxane , photoinitiator , materials science , polymerization , photopolymer , thin film , polymer , polymer chemistry , nanotechnology , composite material , layer (electronics) , monomer
ABSTRACT There is a substantial need for photopattern‐able, heat resistant, and transparent materials that are applicable to electronic devices, such as imaging or display elements. Styryl silsesquioxane based photoresist forms thin micro patterns after i‐line exposure and alkaline development, and the resulting transparent film shows remarkable heat resistance. Radicals generated from a photoinitiator induce polymerization of styryl functionality in the photoresist film to form the micropatterns. © 2014 Wiley Periodicals, Inc. J. Appl. Polym. Sci. 2015 , 132 , 41459.