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Micropatterning of polymethacrylates by single‐ or two‐photon irradiation using π‐conjugated o ‐nitrobenzyl ester phototrigger as side chains
Author(s) -
Jin Ming,
Xu Haoran,
Hong Hong,
Bao Chunyan,
Pu Hongting,
Wan Decheng,
Zhu Linyong
Publication year - 2013
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.39683
Subject(s) - copolymer , monomer , photochemistry , methacrylate , polymer chemistry , chromophore , methyl methacrylate , conjugated system , irradiation , materials science , micropatterning , photodissociation , side chain , chemistry , polymer , organic chemistry , nanotechnology , physics , nuclear physics
A new single‐/two‐photon sensitive monomer, ( E )‐5‐(4‐ethoxystyryl)−2‐nitrobenzyl methacrylate (ENbMA), was synthesized and copolymerized with methyl methacrylate (MMA) to form a series of photosensitive copolymers P(ENbMA–MMA)s that were well characterized by 1 H NMR and GPC. The photochemical and photophysical properties of both photosensitive monomer and copolymers upon visible light irradiation were studied by UV–Vis, FTIR, and HPLC spectra, which confirmed that 5‐(4‐ethoxystyryl)‐2‐nitrobenzyl ester can be photolyzed effectively with generation of the corresponding 5‐(4‐ethoxystyryl)‐2‐nitrosobenzaldehyde and carboxylic acid groups. The successful photocleavage endowed the optimized copolymers with excellent micropatterning property due to the effective generation of alkaline‐soluble carboxylic acid groups. Moreover, the high two‐photon absorption cross‐sections (over 20 GM at 800 nm) and the comparable photolysis upon two‐photon NIR light irradiation of the chromophores provided the copolymers with significant application in two‐photon microfabrication. © 2013 Wiley Periodicals, Inc. J. Appl. Polym. Sci. 130: 4099–4106, 2013