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Cationic photopolymerization of bisphenol A diglycidyl ether epoxy under 385 nm
Author(s) -
Liu Guodong,
Zhu Xiaoqun,
Xu Bingbing,
Qian Xiaochun,
Song Guoqiang,
Nie Jun
Publication year - 2013
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.39612
Subject(s) - photopolymer , diglycidyl ether , cationic polymerization , photoinitiator , epoxy , bisphenol a , monomer , materials science , polymer chemistry , fourier transform infrared spectroscopy , ether , hexafluorophosphate , chemistry , chemical engineering , polymer , organic chemistry , composite material , catalysis , engineering , ionic liquid
The cationic photopolymerization of bisphenol A diglycidyl ether epoxy (DGEBA) at λ = 385 nm was conducted by the combination of a cationic photoinitiator PAG30201 (Bis (4‐isobutylphenyl) iodonium hexafluorophosphate) and a photosensitizer PSS303 (9,10‐dibutoxy‐9,10‐dihydroanthrance). The kinetic characterization was investigated by real‐time Fourier transform infrared spectroscopy. The enhancement of epoxy conversion of DGEBA was achieved by increasing temperature, adding alcohols, active monomers and radical photoinitiators. As a result, in the presence of 2 wt % PAG30201 and 1.2 wt % PSS303, the epoxy rings conversion of DGEBA has reached to more than 70% from 55.9% at room temperature; it could be increased to almost 80% if heated to 60°C. © 2013 Wiley Periodicals, Inc. J. Appl. Polym. Sci. 130: 3698–3703, 2013