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Characterization of antireflective coatings on poly(methyl methacrylate) substrate by different process parameters
Author(s) -
Chiu WeiMing,
Zhang YuanShun,
Tsai PeirAn,
Wu JyhHorng
Publication year - 2013
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.38975
Subject(s) - anti reflective coating , materials science , refractive index , substrate (aquarium) , methyl methacrylate , polymer , coating , layer (electronics) , thin film , porosity , methacrylate , composite material , poly(methyl methacrylate) , spin coating , adhesion , surface roughness , chemical engineering , polymer chemistry , nanotechnology , optoelectronics , polymerization , oceanography , engineering , geology
Abstract The high/low refractive index organic/inorganic antireflective (AR) hybrid polymers were formed using the sol–gel process, in which TiO 2 /2‐hydroxyethyl methacrylate (2‐HEMA) (high refractive index hybrid polymer) and SiO 2 /2‐HEMA (low refractive index hybrid polymer) two‐layer thin films were formed on a hard coating deposited poly(methyl methacrylate) (HC‐PMMA) substrate by both spin coating and dip coating. The relationship between the process parameters and the optical properties, thickness, porosity, surface morphology, and adhesion was determined. The results show that the reflectance of the two‐layer thin films on HC‐PMMA substrate is less than 0.21% (λ = 550 nm), with good adhesion (5B) and a hardness of up to 4H. In addition, the thickness, porosity, and roughness of the films affect refractive index and the antireflection properties of the AR two‐layered thin film. © 2013 Wiley Periodicals, Inc. J. Appl. Polym. Sci., 2013