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Surface microphase separation in PDMS‐ b ‐PMMA‐ b ‐PHFBMA triblock copolymer films
Author(s) -
Lian KeJian,
Chen ChangQing,
Liu Hui,
Wang NingXing,
Yu HaiJiang,
Luo ZhengHong
Publication year - 2010
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.32682
Subject(s) - copolymer , materials science , x ray photoelectron spectroscopy , methyl methacrylate , polymer chemistry , atom transfer radical polymerization , chemical engineering , transmission electron microscopy , polymerization , polymer , composite material , nanotechnology , engineering
Well‐defined poly(dimethylsiloxane)‐ block ‐poly(methyl methacrylate)‐ block ‐poly(2,2,3,3,4,4,4‐heptafluorobutyl methacrylate) (PDMS‐ b ‐PMMA‐ b ‐PHFBMA) triblock copolymers were synthesized via atom transfer radical polymerization (ATRP). Surface microphase separation in the PDMS‐ b ‐PMMA‐ b ‐PHFBMA triblock copolymer films was investigated. The microstructure of the block copolymers was investigated by transmission electron microscopy (TEM) and atomic force microscopy (AFM). Surface composition was studied by X‐ray photoelectron spectroscopy (XPS). The chemical composition at the surface was determined by the surface microphase separation in the PDMS‐ b ‐PMMA‐ b ‐PHFBMA triblock copolymer films. The increase of the PHFBMA content could strengthen the microphase separation behavior in the PDMS‐ b ‐PMMA‐ b ‐PHFBMA triblock copolymer films and reduce their surface tension. Comparison between the PDMS‐ b ‐PMMA‐ b ‐PHFBMA triblock copolymers and the PDMS‐ b ‐PHFBMA diblock copolymers showed that the introduction of the PMMA segments promote the fluorine segregation onto the surface and decrease the fluorine content in the copolymers with low surface energy. © 2010 Wiley Periodicals, Inc. J Appl Polym Sci, 2011