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Effects of diazonaphthoquinone groups on photosensitive coating
Author(s) -
Zhou Haihua,
Zou Yingquan,
Song Yanlin
Publication year - 2010
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.32156
Subject(s) - coating , materials science , lithography , abrasion (mechanical) , composite material , optoelectronics
Abstract Diazonaphthoquinone (DNQ)‐novolak photosensitive materials are important in lithography. DNQ groups play an important role in the photosensitive coating. However, there are no reports on the relationship between content of DNQ groups and properties of the coating. The properties include alkali resistance, isopropanol resistance, and abrasion resistance, the key factors in lithography. The experimental results show proper content of DNQ groups can ensure higher sensitivity, finer resolution, and better abrasion resistance in lithography. © 2010 Wiley Periodicals, Inc. J Appl Polym Sci, 2010