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Optimization of electrospinning an SU‐8 negative photoresist to create patterned carbon nanofibers and nanobeads
Author(s) -
Steach Jeremy K.,
Clark Jonathan E.,
Olesik Susan V.
Publication year - 2010
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.31597
Subject(s) - photoresist , electrospinning , materials science , nanofiber , photolithography , raman spectroscopy , chemical engineering , pyrolysis , composite material , nanotechnology , polymer , optics , physics , engineering , layer (electronics)
The optimization of electrospinning SU‐8 2100 negative photoresist was performed to create carbon micro/nanofibers and beads that can be patterned after electrospinning by using UV radiation. The fiber diameters had a range of 300 nm to 1 μm, based upon the selected electrospinning parameters. Low concentrations of the SU‐8 2100 resulted in beads while specific higher concentrations produced well‐defined fibers. Fibers and beads were converted to carbon through pyrolysis and retained their three dimensional structure. By utilizing the photosensitive properties of the SU‐8 negative photoresist, the electrospun fibers were patterned by UV photolithography. The fibers and beads were characterized by SEM and Raman microscopy, respectively. © 2010 Wiley Periodicals, Inc. J Appl Polym Sci, 2010