Synthesis and photopolymerization of phosphonic acid monomers for applications in compomer materials | Zendy

Catel Yohann | Zendy; Le Pluart Loïc | Zendy; Madec PierreJean | Zendy; Pham ThiNhàn | Zendy

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Synthesis and photopolymerization of phosphonic acid monomers for applications in compomer materials

Author(s) -

Catel Yohann,

Le Pluart Loïc,

Madec PierreJean,

Pham ThiNhàn

Publication year - 2010

Publication title -

journal of applied polymer science

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.575

H-Index - 166

eISSN - 1097-4628

pISSN - 0021-8995

DOI - 10.1002/app.30952

Subject(s) - monomer , photoinitiator , photopolymer , copolymer , methacrylate , reactivity (psychology) , polymer chemistry , thiophenol , materials science , benzoic acid , chemistry , organic chemistry , polymer , medicine , alternative medicine , pathology

Novel methacrylate monomers bearing phosphonic acid groups 1 and 2 as well as new sulfur methacrylates 9 and 10 have been prepared in good yields from thiophenol. They have been fully characterized by 1 H‐NMR, 13 C‐NMR, 31 P‐NMR, and HRMS. Their copolymerization with a bis‐GMA : TEGDMA (1 : 1) blend has been investigated with photodifferential scanning calorimetry at 50°C with camphorquinone as a photoinitiator and ethyl 4‐(dimethylamino)benzoate (EDAB) as a coinitiator. The higher the content of acidic monomer 1 or 2 incorporated in the bis‐GMA : TEGDMA (1 : 1) blend, the lower the mixtures reactivity. The phosphonic acid group has been proved to be responsible for this drop of reactivity. © 2010 Wiley Periodicals, Inc. J Appl Polym Sci, 2010

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