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Photoinduced antimicrobial polymer blends with benzophenone as a functional additive
Author(s) -
Hong Kyung Hwa,
Sun Gang
Publication year - 2009
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.29697
Subject(s) - benzophenone , polymer , materials science , polypropylene , polystyrene , polyvinyl alcohol , polymer chemistry , polyethylene , chemical engineering , composite material , engineering
Benzophenone (BP)‐incorporated polymer films including polystyrene (PS), polyethylene (PE), polypropylene (PP), and polyvinyl alcohol (PVA) films were prepared, and the structural and photoactivated properties were investigated by SEM, XRD, DSC, antimicrobial, and hydrogen peroxide (H 2 O 2 ) production tests. When the amount of incorporated BP concentration was 0.5 wt %, the polymer films were successfully prepared without significant changes in physical properties. Also, all the BP‐incorporated polymer films showed antimicrobial abilities under UVA (365 nm) irradiation, and the effectiveness increased as the amounts of BP in the polymers are increased. On the other hand, it was observed that photoirradiated PVA/BP composite films created H 2 O 2 under the atmospheric dark condition. © 2009 Wiley Periodicals, Inc. J Appl Polym Sci, 2009