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Preparation and adsorption properties of chelating resins from thiosemicarbazide and formaldehyde
Author(s) -
Zhang Liping,
Ni Caihua,
Zhu Changping,
Jiang Xiang,
Liu Yuping,
Huang Bo
Publication year - 2009
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.29627
Subject(s) - adsorption , chelation , formaldehyde , chemistry , metal ions in aqueous solution , x ray photoelectron spectroscopy , metal , langmuir adsorption model , inorganic chemistry , aqueous solution , chelating resin , polymer chemistry , nuclear chemistry , organic chemistry , chemical engineering , engineering
Abstract A novel chelating resin was synthesized in just one step under mild synthetic conditions. The synthesis was carried out through the copolymerization of thiosemicarbazide and formaldehyde in an aqueous solution. The adsorption properties for some noble metal ions were investigated. The results showed that the resin had high adsorption selectivity for Au(III) and Ag(I). The adsorption capacities for the two metal ions reached up to 7.3 and 11.8 mmol/g, respectively. The adsorption rate for the two metal ions in a dilute solution was 99.9%. The adsorption fit first‐order kinetics, and an isothermal adsorption study indicated that it corresponded to Langmuir monomolecular layer adsorption. The change in the bonding energy during the chelating process was investigated with X‐ray photoelectron spectroscopy. The study revealed that nitrogen and sulfur atoms of the resins were electron donors and metal ions were electron acceptors in the process. © 2009 Wiley Periodicals, Inc. J Appl Polym Sci, 2009