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Surface modification and metallization of polyimide using gold colloids as a seed layer
Author(s) -
Kong Yong,
Shao Jianqun,
Wang Wenchang,
Chen Zhidong,
Chu Haixia
Publication year - 2008
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.29188
Subject(s) - polyimide , materials science , fourier transform infrared spectroscopy , surface modification , colloid , chloroauric acid , layer (electronics) , polymer chemistry , chemical engineering , amine gas treating , potassium hydroxide , attenuated total reflection , copper , composite material , colloidal gold , chemistry , organic chemistry , nanoparticle , nanotechnology , metallurgy , engineering
Abstract Herein we report on metallization of Cu on to surface‐modified polyimide resin, the method of which relies on potassium hydroxide‐induced modification of the polyimide surface to introduce carboxylic acid groups and incorporation of gold colloids as a seed layer through reduction of chloroauric acid. The contact angle of modified polyimide surface with water changed from 70 to 35° due to the hydrolysis of polyimide. Secondary amine group on the surface was detected with attenuated total reflection (ATR) Fourier transform infrared (FTIR) spectrophotometry, suggesting that tertiary amine group has turned into secondary group. In addition, on the basis of hydrophilic behavior, we succeeded in depositing gold colloids on the chemically modified surface. SEM image of copper electroless plated on polyimide surface indicated that copper particles were compact and about ∼ 300 nm in diameter. It showed that gold colloids provide an excellent conductive layer to catalyze the electroless plating of Cu on polyimide surface. © 2008 Wiley Periodicals, Inc. J Appl Polym Sci, 2009