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Solubility of carbon dioxide and cosolvents in a photoresist polymer
Author(s) -
Balashova Ida M.,
Russell Marc C.,
Danner Ronald P.,
Duda J. Larry
Publication year - 2008
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.27849
Subject(s) - solubility , polymer , carbon dioxide , photoresist , inverse gas chromatography , thermal diffusivity , chemistry , glass transition , volume (thermodynamics) , atmospheric temperature range , hildebrand solubility parameter , diffusion , polymer chemistry , chemical engineering , materials science , organic chemistry , thermodynamics , physics , layer (electronics) , engineering
Solubility and diffusivity of cosolvents and carbon dioxide in a photoresist polymer have been measured below the glass transition temperature bythe inverse gas chromatography and static capsule methods over a temperature range of 75–100°C and pressures up to 7000 kPa. The results showed that presence of even low pressures of CO 2 increased the solubility and diffusivity of the cosolvents studied. Experiments in which exposure of the polymer to CO 2 was cycled on and off indicated that the free volume introduced by the CO 2 persisted in the polymer for a significant time after removal of the CO 2 . © 2008 Wiley Periodicals, Inc. J Appl Polym Sci, 2008