Solubility of carbon dioxide and cosolvents in a photoresist polymer | Zendy

Balashova Ida M. | Zendy; Russell Marc C. | Zendy; Danner Ronald P. | Zendy; Duda J. Larry | Zendy

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Solubility of carbon dioxide and cosolvents in a photoresist polymer

Author(s) -

Balashova Ida M.,

Russell Marc C.,

Danner Ronald P.,

Duda J. Larry

Publication year - 2008

Publication title -

journal of applied polymer science

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.575

H-Index - 166

eISSN - 1097-4628

pISSN - 0021-8995

DOI - 10.1002/app.27849

Subject(s) - solubility , polymer , carbon dioxide , photoresist , inverse gas chromatography , thermal diffusivity , chemistry , glass transition , volume (thermodynamics) , atmospheric temperature range , hildebrand solubility parameter , diffusion , polymer chemistry , chemical engineering , materials science , organic chemistry , thermodynamics , physics , layer (electronics) , engineering

Solubility and diffusivity of cosolvents and carbon dioxide in a photoresist polymer have been measured below the glass transition temperature bythe inverse gas chromatography and static capsule methods over a temperature range of 75–100°C and pressures up to 7000 kPa. The results showed that presence of even low pressures of CO 2 increased the solubility and diffusivity of the cosolvents studied. Experiments in which exposure of the polymer to CO 2 was cycled on and off indicated that the free volume introduced by the CO 2 persisted in the polymer for a significant time after removal of the CO 2 . © 2008 Wiley Periodicals, Inc. J Appl Polym Sci, 2008

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