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Dial‐a‐size: Precision quantum dot nanopatterning using cheap, off‐the‐shelf copolymers
Author(s) -
McCarthy W.,
Ciszek P.,
Zeghbroeck B. Van,
Borsa T.,
Powers R.
Publication year - 2008
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.27268
Subject(s) - copolymer , materials science , polymer , nanolithography , nanoscopic scale , nanotechnology , quantum dot , template , etching (microfabrication) , fabrication , polymer chemistry , composite material , layer (electronics) , medicine , alternative medicine , pathology
In the use of block copolymers as templates for nanolithography, deposition, or etching, substantial time and cost savings can be achieved through the use of algebraic models for block copolymer feature size as a function of both the polymer's molecular weight and the relative concentration of a homopolymer additive. Desired average pore diameters and spacing can be achieved on the first try, using off‐the‐shelf polymers in a wide range of molecular weights. This allows precise nanoscopic components such as quantum dots to be patterned over large areas rapidly, repeatably, and at very low cost. © 2008 Wiley Periodicals, Inc. J Appl Polym Sci, 2008