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Block copolymers of cyclohexene oxide and ketonic resins via condensation and promoted cationic polymerization
Author(s) -
Ergun Selin,
Kızılcan Nilgün,
Önen Ayşen
Publication year - 2007
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.26148
Subject(s) - cyclohexene oxide , cationic polymerization , polymer chemistry , copolymer , benzoin , polymerization , chemistry , monomer , formaldehyde , cyclohexanone , materials science , organic chemistry , catalysis , polymer
Block copolymers of cyclohexene oxide (CHO) and ketonic resin were prepared by using ketonic resins as free radical photoinitiators via two‐step procedure. In the first step, cyclohexanone–formaldehyde and acetophenone–formaldehyde resins were modified during their preparation with benzoin and benzoin isobutyl ether. Then, AB or ABA type block copolymers depending on the resin employed were obtained by irradiation of these resins in the presence of pyridinium salt and CHO as a cationically polymerizable monomer. By this way, block copolymers of CHO with ketonic resin were prepared and characterized by GPC, DCS, FTIR, and 1 H NMR spectral measurements. © 2007 Wiley Periodicals, Inc. J Appl Polym Sci 2007