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Formation of nanoporous poly(methyl silsesquioxane) thin films using adamantane for low‐k application
Author(s) -
Cha B. J.,
Yang J. M.
Publication year - 2007
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.25886
Subject(s) - silsesquioxane , nanoporous , materials science , methyltrimethoxysilane , nanoindenter , chemical engineering , dielectric , thin film , fourier transform infrared spectroscopy , dynamic mechanical analysis , porosity , composite material , adamantane , polymer chemistry , polymer , nanoindentation , nanotechnology , organic chemistry , chemistry , optoelectronics , engineering , coating
Nanoporous poly(methyl silsesquioxane) PMSSQ thin films for low‐k application have been prepared using chemically attached adamantylphenols as pore generating materials (porogen). To obtain the mechanically stable porous structure, multifunctional 1,2‐bistrimethoxysilylethane (BTMSE) was employed in addition to methyltrimethoxysilane as a main matrix material. From the decomposition of porogen, confirmed by FTIR and TGA, the nanoporous thin films containing pores less than 5 nm, which are characterized using sorption analysis, were successfully achieved. The dielectric constant was significantly decreased to 1.9, while maintaining the stable mechanical properties with the elastic modulus of 3.7 GPa measured by a nanoindenter. © 2007 Wiley Periodicals, Inc. J Appl Polym Sci 2007