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Surface relief gratings on azo polymer films through reversible photoisomerization by the irradiation of a monochromatic light
Author(s) -
Alam Md. Zahangir,
Ohmachi Tomoko,
Ogata Tomonari,
aka Takamasa,
Kurihara Seiji
Publication year - 2006
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.24180
Subject(s) - irradiation , azobenzene , photoisomerization , materials science , photomask , monochromatic color , diffraction efficiency , laser , optics , grating , polymer , diffraction grating , diffraction , optoelectronics , nanotechnology , chemistry , composite material , resist , isomerization , biochemistry , catalysis , physics , layer (electronics) , nuclear physics
Surface relief gratings were induced on azobenzene‐functionalized polymer films by exposure to s‐polarized and circularly polarized Ar + ‐laser (488‐nm) irradiation through a photomask. The surface relief structures were investigated with atomic force microscopy. A very regularly spaced surface grating with a modulation depth of about 400 nm was obtained after 30 min of circularly polarized Ar + ‐laser irradiation. The diffraction efficiency was measured after irradiation by an Ar + laser, and an efficiency of about 2% was achieved. The polymer films also showed a very high period of recording. © 2006 Wiley Periodicals, Inc. J Appl Polym Sci 102: 3123–3126, 2006