Surface relief gratings on azo polymer films through reversible photoisomerization by the irradiation of a monochromatic light | Zendy

Alam Md. Zahangir | Zendy; Ohmachi Tomoko | Zendy; Ogata Tomonari | Zendy; aka Takamasa | Zendy; Kurihara Seiji | Zendy

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Surface relief gratings on azo polymer films through reversible photoisomerization by the irradiation of a monochromatic light

Author(s) -

Alam Md. Zahangir,

Ohmachi Tomoko,

Ogata Tomonari,

aka Takamasa,

Kurihara Seiji

Publication year - 2006

Publication title -

journal of applied polymer science

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.575

H-Index - 166

eISSN - 1097-4628

pISSN - 0021-8995

DOI - 10.1002/app.24180

Subject(s) - irradiation , azobenzene , photoisomerization , materials science , photomask , monochromatic color , diffraction efficiency , laser , optics , grating , polymer , diffraction grating , diffraction , optoelectronics , nanotechnology , chemistry , composite material , resist , isomerization , biochemistry , catalysis , physics , layer (electronics) , nuclear physics

Surface relief gratings were induced on azobenzene‐functionalized polymer films by exposure to s‐polarized and circularly polarized Ar + ‐laser (488‐nm) irradiation through a photomask. The surface relief structures were investigated with atomic force microscopy. A very regularly spaced surface grating with a modulation depth of about 400 nm was obtained after 30 min of circularly polarized Ar + ‐laser irradiation. The diffraction efficiency was measured after irradiation by an Ar + laser, and an efficiency of about 2% was achieved. The polymer films also showed a very high period of recording. © 2006 Wiley Periodicals, Inc. J Appl Polym Sci 102: 3123–3126, 2006

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