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Polybenzyl methacrylate brush used in the top‐down/bottom‐up approach for nanopatterning technology
Author(s) -
Tsai Yuhsin,
Wang WeiChing
Publication year - 2006
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.23686
Subject(s) - materials science , atom transfer radical polymerization , lithography , scanning electron microscope , polymerization , methacrylate , brush , chemical engineering , polymer chemistry , nanotechnology , composite material , polymer , optoelectronics , engineering
Atom‐transfer radical polymerization (ATRP) of benzyl methacrylate (BzMA) at ambient temperature was applied to step and flash imprint lithography. This process involved the formation of patterned polymeric networks (top‐down) and the grafting polymerization of BzMA from these networks (bottom‐up) via ATRP. Confocal laser scanning microscope and scanning electron microscope were used to determine the change in line‐to‐line separation (width) resulting from poly BzMA brush. The increase in line width at 400 nm could be maximized given a reaction time of 2 h. © 2006 Wiley Periodicals, Inc. J Appl Polym Sci 101: 1953–1957, 2006