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Femtosecond‐laser‐assisted wet chemical etching of polymer materials
Author(s) -
Wochnowski C.,
Hanada Y.,
Cheng Y.,
Metev S.,
Vollertsen F.,
Sugioka K.,
Midorikawa K.
Publication year - 2006
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.23492
Subject(s) - materials science , irradiation , femtosecond , polymer , laser , polycarbonate , polyimide , fluence , composite material , polyethylene , polymer chemistry , optics , layer (electronics) , physics , nuclear physics
Polymers are modified by femtosecond‐(fs)‐IR‐laser irradiation under various process parameters. Several sorts of thermoplastic polymer are employed: polymethylmethacrylate (PMMA), fluorinated PMMA, poly‐ N ‐methyl methacrylimide (PMMI), polystyrol, polycarbonate, polyimide, and polyethylene. After the fs‐laser‐induced modification process, the irradiated area is developed by an aqueous solution of a solvent agent ( n ‐hexane, benzene, and methylisobutylketone). The surface topography of the fs‐laser‐irradiated area is characterized by stylus‐profilometry before and after the development procedure. Some preliminary explanations are given about the solution mechanism of the fs‐laser‐irradiated polymer region. The experimental results are relevant for the fabrication of three‐dimensional (3D)‐structures in the volume of a transparent polymer material by fs‐laser irradiation. © 2006 Wiley Periodicals, Inc. J Appl Polym Sci 100: 1229–1238, 2006